发明名称 Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith
摘要 A method is disclosed of forming a pattern in a metallized region, the method comprising: transferring a metal etching solution to portions of an exposed surface of the metallized region using a printing process; allowing the etching solution to react with the metallized region to selectively demetallize the surface; and washing the selectively demetallized surface.
申请公布号 EP1699276(A3) 申请公布日期 2007.03.14
申请号 EP20060009477 申请日期 2002.04.30
申请人 NEOLOGY, INC. 发明人 MARTINEZ DE VELASCO CORTINA, FRANCISCO;RIEZLER, MANFRED
分类号 B42D15/10;G06K19/07;G02B5/122;G02B5/124;G02B5/128;G06K19/06;G06K19/077;G06K19/08;G08B13/14;G08B29/00;G09F3/00;G09F3/02;H01Q1/38;H05K1/00;H05K3/06 主分类号 B42D15/10
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