BATCH CONTROL SYSTEM FOR USE IN SEMICONDUCTOR FABRICATING PROCESS

摘要

A batch control system in a semiconductor fabrication is provided to reduce a wafer charge time and improve the operation rate of equipment and to enhance the productivity by using a batch control unit b. A batch control system in a semiconductor fabrication includes process equipment and a batch control unit. The process equipment(20) is used for performing a predetermined process corresponding to each parameter, wherein the each parameter is provided according to the number of lots. The batch control unit(10) is used for storing basic process parameters according to the number of the lots and supplying corresponding process parameters according to the number of the lots to the process equipment.