发明名称 Lithographic apparatus and device manufacturing method
摘要 <p>A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus. <IMAGE></p>
申请公布号 EP1586948(B1) 申请公布日期 2007.03.14
申请号 EP20050252116 申请日期 2005.04.04
申请人 ASML NETHERLANDS B.V. 发明人 KOLESNYCHENKO, ALEKSEY, YURIEVICH;BASELMANS, JOHANNES, JACOBUS, MATHEUS;DONDERS, SJOERD, NICOLAAS, LAMBERTUS;HOOGENDAM, CHRISTIAAN, ALEXANDER;MERTENS, JEROEN, JOHANNES, SOPHIA, MARIA;MULKENS, JOHANNES, CATHARINUS, HUBERTUS;PEETERS, FELIX, GODFRIED, PETER;STREEFKERK, BOB;TEUNISSEN, FRANCISCUS, JOHANNES, HERMAN, MARIA;VAN SANTEN, HELMAR;JANSEN, HANS
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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