发明名称 Mold, imprint apparatus, and process for producing structure
摘要 <p>In order to alleviate or suppress curing of a photocurable resin material in an area in which the curing of the photocurable resin material is not intended, exposure of the photocurable resin material to light is suppressed through a non-pattern portion at which a light-blocking member is provided by means of a mold having an imprint pattern portion and the non-pattern portion or is suppressed by disposing a light-blocking member so as not to irradiate the photocurable resin material with light not via the mold.</p>
申请公布号 EP1762893(A1) 申请公布日期 2007.03.14
申请号 EP20060120143 申请日期 2006.09.05
申请人 CANON KABUSHIKI KAISHA 发明人 SUEHIRA, NOBUHITO;SEKI, JUNICHI
分类号 G03F7/00;B29C35/08;B29C59/02;B81C99/00;B82Y10/00 主分类号 G03F7/00
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