发明名称 |
Mold, imprint apparatus, and process for producing structure |
摘要 |
<p>In order to alleviate or suppress curing of a photocurable resin material in an area in which the curing of the photocurable resin material is not intended, exposure of the photocurable resin material to light is suppressed through a non-pattern portion at which a light-blocking member is provided by means of a mold having an imprint pattern portion and the non-pattern portion or is suppressed by disposing a light-blocking member so as not to irradiate the photocurable resin material with light not via the mold.</p> |
申请公布号 |
EP1762893(A1) |
申请公布日期 |
2007.03.14 |
申请号 |
EP20060120143 |
申请日期 |
2006.09.05 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SUEHIRA, NOBUHITO;SEKI, JUNICHI |
分类号 |
G03F7/00;B29C35/08;B29C59/02;B81C99/00;B82Y10/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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