| 摘要 |
FIELD: producing sensing mass hanger flexible members for micromechanical measuring devices. ^ SUBSTANCE: proposed method for manufacturing flexible member of micromechanical device includes oxidation of single-crystalline silicon plate with its surface positioned in plane 100, covering of this plate on both ends with photoresist layer, windows being opened in photoresist layer in advance by means of double-ended photolithography, oxidant etching on opened windows of width L1 in vicinity of flexible member formation, and anisotropic etching of plate to intermediate depth h. After oxidant etching groove of width L1 and length M is made at point of flexible member formation by way of anisotropic etching up to self-stopping, windows are opened again in oxidant for final formation of flexible member, and anisotropic etching is conducted to obtain desired thickness of flexible member H whose thickness is to be found from formula H = (T1 - Tgr)V, where T1 is etching time for projecting corners of groove; Tgr is groove formation time; V is anisotropic etching rate, ^ EFFECT: reduced labor consumption, enhanced precision and quality. ^ 1 cl, 5 dwg |
