发明名称 SOLID-STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>A solid-state imaging device, comprising: a semiconductor substrate (101) having a first surface; a solid-state imaging element (102) in the first surface of semiconductor substrate, the solid-state imaging element comprising a light-receiving region; a light-transmission member (201) having a second surface and a third surface, the second surface being opposite to the third surface, wherein the light-transmission member and the first surface of the semiconductor substrate define a gap (C) between the second surface of the light-transmission member and an outer surface of the light-receiving region; and an external connection terminal (BP) connected to the solid-state imaging element, wherein the light-transmission member comprises low ±-ray glass.</p>
申请公布号 KR100692446(B1) 申请公布日期 2007.03.09
申请号 KR20040058714 申请日期 2004.07.27
申请人 发明人
分类号 H01L27/14;H01L27/148;H01L23/02;H01L27/146;H01L31/02;H01L31/10;H04N5/225;H04N5/335;H04N5/369;H04N5/372 主分类号 H01L27/14
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