APPARATUS AND METHOD FOR ETCHING AN EDGE OF A SUBSTRATE

摘要

An apparatus and a method for etching an edge of a substrate are provided to convert an etching liquid state from an unsteady state to a steady state by using a nozzle arranged at a predetermined position. A substrate is placed on a substrate supporter. A nozzle(310) provides an etching liquid from an upper portion of the substrate to the substrate. The nozzle is connected to an end of the nozzle arm(322). A nozzle moving unit(320) moves the nozzle through the nozzle arm from a first position to a second position. The first position is an upper portion of the outside of the substrate. The second position is an upper portion of an edge of the substrate. The nozzle is downwardly tilted to the outside of the substrate at the first position.