METHOD FOR FORMING HIGH ASPECT RATIO NANOSTRUCTURE AND METHOD FOR FORMING NANO PATTERN USING THE SAME

摘要

A method of fabricating nano-structure with high aspect ratio is provided to produce the nano-structure useful for forming microfine pattern of electronic device, reproduce natural cilia in nano-level and reduce frictional resistance or drag of surface of a material by forming a polymer film on a substrate, forming a polymer pattern on a mold and extending the pattern after removing the mold. The method includes the steps of: forming a polymer film(20) on a substrate; bringing the polymer film into contact with a mold(30); forming polymer pattern(22) of the film in contact with intaglio base(32) of the mold by flowing the polymer film; and removing the polymer film having the polymer pattern to produce a nano-structure with extended polymer pattern. The polymer film contains thermoplastic resin. The mold includes at least one selected from polyurethane, polydimethylsiloxane(PDMS) and silicon oxide(SiO2). The flowing of polymer film is conducted by heating the polymer film.