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发明名称
METHOD AND APPARATUS FOR THERMAL PROCESSING OF SEMICONDUCTOR SUBSTRATES
摘要
申请公布号
KR100692496(B1)
申请公布日期
2007.03.09
申请号
KR20017002448
申请日期
2001.02.26
申请人
发明人
分类号
H01L21/324
主分类号
H01L21/324
代理机构
代理人
主权项
地址
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