发明名称 PRESSURE-SENSITIVE ADHESIVE SHEET AND METHOD OF PROCESSING ARTICLES
摘要 <p>Provided is a pressure-sensitive adhesive sheet, which is suitable as an adhesive sheet for processing semiconductor wafers, hardly contaminates or does damage semiconductor wafers during processing, and reduces warpage of a product by residual stress of the adhesive sheet. The pressure-sensitive adhesive sheet comprises a substrate, an intermediate layer, and an adhesive layer in the order stated. The intermediate layer has a tensile elasticity of 1-100MPa at 23‹C and is formed of acrylic polymer. The acrylic polymer is formed by polymerizing a (meth)acrylic monomer mixture comprising 1-20wt% of a nitrogen-containing acryl monomer. The acrylic polymer contains 20wt% or less of a polymer component having a molecular weight of 100,000 or less. The substrate comprises at least one layer of film having a tensile elasticity of 0.6GPa or more at 23‹C.</p>
申请公布号 KR20070027464(A) 申请公布日期 2007.03.09
申请号 KR20060085304 申请日期 2006.09.05
申请人 NITTO DENKO CORPORATION 发明人 YANO KOHEI;AKAZAWA KOUJI;YOSHIDA YOSHINORI;KONTANI TOMOHIRO
分类号 C09J133/08;C09J7/02;C09J133/10 主分类号 C09J133/08
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