| 摘要 |
A substrate docking apparatus is provided to prevent the failure of a substrate by removing completely liquid from an upper surface of a docking body using an improved shutter structure. A substrate docking apparatus includes a body, a base, a shutter and an actuator. The body(10) is arranged adjacent to a sidewall of a chamber. The body includes a through hole connected with an exhaust hole. The base(20) contacts the body. The base includes an outlet connected with the through hole of the body. The shutter(30) is installed at a side portion of the base. The shutter is capable of moving up and down. The shutter includes a liquid removing member capable of removing liquid from the through hole of the body. The actuator(40) is used for moving the shutter up and down.
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