发明名称 |
METHOD FOR FABRICATING OF WIRE GRID POLARIZER |
摘要 |
A method of manufacturing a wire grid polarizer is provided to fabricate a wire grid polarizer having a high polarization extinction ratio through a simple process using microcontact lithography and atomic layer deposition without using an exposure process and an etch process. A plurality of patterns are formed of a self assembly monolayer material(210b) on a substrate(300). The self assembly monolayer inhibits the formation of a metal layer. A metal thin film(400) is deposited between neighboring patterns. The plurality of patterns are formed using microcontact lithography. The metal thin film is formed using atomic layer deposition. |
申请公布号 |
KR20070027083(A) |
申请公布日期 |
2007.03.09 |
申请号 |
KR20050079470 |
申请日期 |
2005.08.29 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
KIM, SANG HOON;LEE, KI DONG |
分类号 |
G02F1/1335 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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