发明名称 HEAT TREATMENT DEVICE
摘要 A heat treatment equipment which prevents generation of nonuniform display irrespective of large or small surface pressure, reduces deterioration of productivity, has superior thermal efficiency and can correspond to various types of substrates is provided. A heat treatment equipment comprises: a heat treatment furnace having a heat treatment chamber(11) for heat-treating a work that is a glass substrate for LCD(liquid crystal display) panel; a rack(12) installed in the heat treatment chamber to support a plurality of works in multistage; a multistage shutter which is installed at a work injection port and a work discharge port of the heat treatment furnace and have a plurality of up-and-down slide members; and a robot hand(25) for injecting the work into the heating treatment furnace or discharging the work from the heat treatment furnace. The rack comprises: multiple shelves(21) on each of which one substrate is loaded; four front supports(22) for supporting a front part of the shelf of each stage; two rear supports(23) for supporting a rear part of the shelves; a cross bar(24) laid over the two rear supports. The four front supports are comprised of two fixed rods(32) and two movable rods(33).
申请公布号 KR20070027298(A) 申请公布日期 2007.03.09
申请号 KR20050082756 申请日期 2005.09.06
申请人 KOYO THERMO SYSTEMS CO., LTD. 发明人 KAWAMOTO HIROSHI
分类号 F27D3/12 主分类号 F27D3/12
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