| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a formation method of a dye-sensitized semiconductor electrode superior in mass-producibility. <P>SOLUTION: This is a method of forming a dye-sensitized semiconductor electrode on an electrode pattern 22 and comprises a process in which a semiconductor electrode forming mask 30a, in which a hot melt layer 8 is covered by a covering layer 4 consisting of a metal material and has an aperture 32a penetrating through the front and rear sides, is thermo-compression bonded to a substrate on which the electrode pattern 22 is formed on the surface, so that the aperture 32a and the electrode pattern 22 may be properly positioned, a process in which the semiconductor electrode material is filled into the aperture 32a, a process in which a photosensitized dye is carried on the semiconductor electrode material 34b filled in the aperture 32a, and a process in which the semiconductor electrode forming mask 30a is separated. <P>COPYRIGHT: (C)2007,JPO&INPIT |
