发明名称 Method for forming metal oxide coating film and vapor deposition apparatus
摘要 A photocatalytic composite material having a photocatalytic titanium oxide film on the surface of a substrate is produced by a CVD method in which TiCl<SUB>4 </SUB>vapor is reacted with water vapor. The TiCl<SUB>4 </SUB>vapor and the water vapor are injected into a vapor deposition chamber ( 9 ) through nozzles ( 5 ) and ( 6 ), respectively, such that the resulting two injected vapor streams meet before reaching the substrate, thereby mixing the two vapors. Within 3 seconds after this mixing, the mixed vapors are brought into contact with a substrate ( 1 ) which is moving in one direction. Preferably the TiCl<SUB>4 </SUB>vapor is injected in a reverse direction with respect to the direction of movement of the substrate through a multi-orifice nozzle ( 5 ), while the water vapor is injected through a slit nozzle ( 6 ) disposed at a smaller angle with respect to the substrate.
申请公布号 US2007054044(A1) 申请公布日期 2007.03.08
申请号 US20040564015 申请日期 2004.07.06
申请人 SUMITOMO TITANIUM 发明人 SHIMOSAKI SHINJI;OGASAWARA TADASHI;NAGAOKA SADANOBU;MASAKI YASUHIRO
分类号 C01B13/14;C23C16/00;B01J21/06;B01J35/00;B01J35/02;B01J37/02;C01G23/04;C01G23/07;C23C16/40;C23C16/44;C23C16/455;C23C16/54;C23C16/56 主分类号 C01B13/14
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