LAMINATE POLISHING PAD

摘要

Disclosed is a method for production of a laminate polishing pad which comprises a reduced number of steps and is excellent in productivity rate, and which causes no detachment between a polishing layer and a cushion layer and can prevent the gutter clogging caused by a slurry or the like. Also disclosed is a laminate polishing pad produced by the method. A method for production of a laminate polishing pad comprising the steps of preparing a gas bubble-dispersed urethane composition by a mechanical floss process, ejecting the composition onto a cushion layer continuously while feeding the cushion layer, curing the composition while controlling the thickness of the composition evenly to form a polishing layer comprising a polyurethane foam, thereby producing a long laminate sheet, and cutting the sheet.