发明名称 METHOD OF FORMING A PHASE CHANGEABLE MATERIAL LAYER, AND METHODS OF MANUFACTURING A PHASE CHANGEABLE MEMORY UNIT AND A PHASE CHANGEABLE MEMORY DEVICE USING THE SAME
摘要 A method for forming a phase change material layer, a phase change memory unit using the same and a method for manufacturing a phase change memory device are provided to control easily a compositional rate of the phase change material layer and to form quickly the phase change material layer in a low temperature by using a variety of source gases. A first material layer is formed on an object body by supplying a first source gas containing a first material into a reaction chamber(S20). A first composite material layer containing the first material and a second material is formed on the object body by supplying a second source gas containing the second material into the reaction chamber(S40). A third material layer is formed on the first composite material layer by supplying a third source gas containing a third material into the reaction chamber(S60). A second composite material layer containing the third material and a fourth material is formed on the first composite material layer by supplying a fourth source gas containing the fourth material into the reaction chamber(S80).
申请公布号 KR20070025612(A) 申请公布日期 2007.03.08
申请号 KR20050081965 申请日期 2005.09.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, JIN IL;LEE, CHOONG MAN;CHO, SUNG LAE;PARK, YOUNG LIM
分类号 H01L21/205;H01L21/8247 主分类号 H01L21/205
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