发明名称 |
METHOD OF FORMING A PHASE CHANGEABLE MATERIAL LAYER, AND METHODS OF MANUFACTURING A PHASE CHANGEABLE MEMORY UNIT AND A PHASE CHANGEABLE MEMORY DEVICE USING THE SAME |
摘要 |
A method for forming a phase change material layer, a phase change memory unit using the same and a method for manufacturing a phase change memory device are provided to control easily a compositional rate of the phase change material layer and to form quickly the phase change material layer in a low temperature by using a variety of source gases. A first material layer is formed on an object body by supplying a first source gas containing a first material into a reaction chamber(S20). A first composite material layer containing the first material and a second material is formed on the object body by supplying a second source gas containing the second material into the reaction chamber(S40). A third material layer is formed on the first composite material layer by supplying a third source gas containing a third material into the reaction chamber(S60). A second composite material layer containing the third material and a fourth material is formed on the first composite material layer by supplying a fourth source gas containing the fourth material into the reaction chamber(S80).
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申请公布号 |
KR20070025612(A) |
申请公布日期 |
2007.03.08 |
申请号 |
KR20050081965 |
申请日期 |
2005.09.03 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, JIN IL;LEE, CHOONG MAN;CHO, SUNG LAE;PARK, YOUNG LIM |
分类号 |
H01L21/205;H01L21/8247 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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