| 摘要 |
An electromagnetic wave absorptive film by destructive interference and method for manufacturing the same are provided to allow use of phase offset to offset and absorb the electromagnetic wave, to allow the electromagnetic wave absorptive film to have actual thin thickness available to use, and to remove earthing installation without occurrence of electric connection. The electromagnetic wave absorptive film by destructive interference includes wave absorbing and/or wave-reflecting particles in monolayer and/or bilayer; a compound layer(1) of which thickness is 1/4n times of the wave length of desired waves intended to absorb; and a reflective layer which covers the one side of compound layer and has a larger refractive index than that of the compound layer.
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