发明名称 MULTILAYER FILM REFLECTOR AND ALIGNER
摘要 <P>PROBLEM TO BE SOLVED: To provide a multilayer film reflector having a total film stress uniform and minimum over the entire deposited film surface. <P>SOLUTION: The multilayer film reflector has a first light reflector (A1) composed of paired laminated layer each comprising a molybdenum-containing layer (105) and a silicon-containing layer (103), and a second part (B1, B2) composed of layers so constituted as to cancel the stress the first part has on a substrate. The constitution of the layers of the second part is so changed as to cancel the stress of the first part according to the distribution of the stress over a plane parallel to the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007059743(A) 申请公布日期 2007.03.08
申请号 JP20050245270 申请日期 2005.08.26
申请人 NIKON CORP 发明人 KAMITAKA NORIAKI
分类号 H01L21/027;G02B5/08;G02B5/26;G03F7/20;G21K1/06 主分类号 H01L21/027
代理机构 代理人
主权项
地址