| 摘要 |
An arrangement for controlling the deflection of an electron beam in a vapor deposition system includes a control unit to which are assigned deflection modules ( 23, 27 ) which can be driven in accordance with respective selected functions. By driving these deflection modules, the electron beam can be deflected in two coordinate directions. At least one of the selected functions has a time-changing term via which the periodicity of the deflection of the electron beam ( 14 ) changes with respect to this coordinate direction. The term can be pregiven manually or automatically. The invention also relates to a method for controlling the deflection of the electron beam in a vapor deposition system.
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