发明名称 NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE HAVING ION-CONDUCTIVE LAYER, AND MANUFACTURING AND OPERATION METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a non-volatile semiconductor memory device having an ion-conductive layer, and to provide the manufacturing and operation methods of the non-volatile semiconductor memory device. <P>SOLUTION: In the non-volatile memory device, having a substrate, a switching element formed on the substrate, and a storage node connected to the switching element, and the manufacturing and operation methods of the non-volatile memory device, the storage node comprises a lower electrode that is connected to the switching element and is used as an ion source; a data storage layer formed on the lower electrode and is partially separated from the lower electrode; a side electrode whose side is connected to the data storage layer section separated from the lower electrode while being separated from the lower electrode; and an upper electrode formed on the data storage layer. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007059914(A) 申请公布日期 2007.03.08
申请号 JP20060226988 申请日期 2006.08.23
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 RI SHOKEN
分类号 H01L27/10;H01L45/00;H01L49/00 主分类号 H01L27/10
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