| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist coating apparatus that can suppress a difference from occurring in the thickness of a resist applied even when a resist is continuously applied for a long time. <P>SOLUTION: The resist coating apparatus is equipped with an immersion tank 5 holding a resist solution prepared by dissolving a resist in a solvent, where a roller 4a is partially immersed in the resist solution, a buffer container 7 to circulate the resist solution from and to the immersion tank 5, a densitometer 11 to measure the concentration of the resist solution, and a solvent adding unit (8, 8a, 9, 12) to add the solvent to the resist solution to control the concentration of the resist solution constant based on the measurement result by the densitometer 11. A viscometer may be used instead of the densitometer 11. <P>COPYRIGHT: (C)2007,JPO&INPIT |
