发明名称 CHAMFERED LARGE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a large substrate, having high dimensional accuracy in a chamfered part on an end face of the substrate and easily assembled in an exposure apparatus, and to provide a method for manufacturing the substrate. <P>SOLUTION: The large substrate has the diagonal length of 500 mm or larger and within±0.05 mm dimensional accuracy of a chamfered width (C-chamfering) on the upper and lower faces of the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007057638(A) 申请公布日期 2007.03.08
申请号 JP20050240699 申请日期 2005.08.23
申请人 SHIN ETSU CHEM CO LTD 发明人 KUSAKAI DAISUKE;SHIBANO YUKIO;UEDA SHUHEI;WATABE ATSUSHI
分类号 C03B20/00;C03B33/037;G02F1/13;G02F1/1333;G03F1/60;G03F1/68 主分类号 C03B20/00
代理机构 代理人
主权项
地址