| 摘要 |
PROBLEM TO BE SOLVED: To provide a stage structure of a normal-pressure plasma processing apparatus capable of dealing with substrates of different sizes while dealing with upsizing of a substrate. SOLUTION: The upper surface of the stage body 21 of the stage 20 of the normal-pressure plasma processing apparatus M is assumed to be a substrate installation face made of metal. A splicing member 31 is provided on the side of the stage body 21, an upper surface of which is assumed to be the substrate installation face made of metal. The splicing member 31 is made to go forward and backward between a splicing position and a withdrawal position by a splicing member going-forward and backward mechanism 32. The upper surface of the splicing member 31 at the splicing position is flush with the upper surface of the stage body 21, and is attached to the edge of the stage body 21. The splicing member 31 at the withdrawal position is separated away from the splicing position. COPYRIGHT: (C)2007,JPO&INPIT |
