| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem in the conventional sputtering film deposition system that electric discharge isapt to extinguished by repeating film deposition. SOLUTION: In a reactive sputtering film deposition system where the inside of the same chamber is provided with a plurality of targets, also, at least one of them is a transition element target, and further, at least one among the plurality of targets is a metal target requiring hydrogenation for producing a fluoride thin film of low absorption, when discharge is performed using the metal target requiring hydrogenation, the transition element target and electrode parts at the circumferences thereof have been covered with a material different from the transition element, thus the discharge stability in the transition element target is retained. COPYRIGHT: (C)2007,JPO&INPIT
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