| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern correction device with a long continuous use time. <P>SOLUTION: With this pattern correction device, an atomized gas flow is set at a given level lower than the lowest sprayable limit at a time when deposition of correction liquid is finished at a defective part, and stops generation of fog particles P of the correction liquid 20 in the deposition device 5 and at the same time, blasts the fog particles P of the correction liquid in the deposition device 5. Therefore, clogging of the device is prevented to extend a continuous use time of the device. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
