| 摘要 |
PROBLEM TO BE SOLVED: To particularly improve wear resistance and high temperature oxidation resistance of a hard film by the increase of its hardness without sacrificing the characteristics of adhesion and toughness therein. SOLUTION: The hard film has a composition comprising Si and one or more metallic elements selected from the group 4a, 5a, 6a metals, Al and B, and one or more nonmetallic elements selected from C, N and O. The hard film has a columnar structure. Each crystal grain in the columnar structure has a multilayer structure composed of a plurality of layers having a difference in the Si content, a region in which at least crystal lattice streaks are continued is present in the boundary region between the layers, provided that the peak intensity ofαtype Si<SB>3</SB>N<SB>4</SB>by Raman spectroscopic analysis is defined as Iαand the peak intensity ofβtype Si<SB>3</SB>N<SB>4</SB>as Iβ, 1.0≤Iβ/Iα≤20.0 is satisfied, and, provided that the peak intensity of the (200) plane by X-ray diffraction is defined as Ib and the peak intensity of the (111) plane as Ia, Ib/Ia≤1.0 is satisfied. COPYRIGHT: (C)2007,JPO&INPIT
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