| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic projection apparatus in which a balance mass is supported by a base frame using at least one supporting member which is coupled to both the base frame and balance mass. Free horizontal movement is provided by providing the supporting member with at least two pivot points.
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| 申请公布号 |
US2007052944(A1) |
申请公布日期 |
2007.03.08 |
| 申请号 |
US20060593022 |
申请日期 |
2006.11.06 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JACOBS HERNES;COX HENRIKUS H.M.;VOSTERS PETRUS M.H. |
| 分类号 |
G03B27/58;G03F7/20;G03B7/20;G03B27/42;H01L21/027;H01L21/68 |
主分类号 |
G03B27/58 |
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