INTEGRATED METROLOGY TOOLS FOR MONITORING AND CONTROLLING LARGE AREA SUBSTRATE PROCESSING CHAMBERS

摘要

Integrated metrology tools for monitoring and controlling large area substrate processing chambers are provided to reduce the generation of mis-processing on a substrate by performing properly aiming processing on the substrate. A measurement chamber(418) of a substrate processing module is used for monitoring or controlling at least one substrate processing chamber. The measurement chamber is composed of at least one or more first type measurement units and at least one or more second type measurement units. At least one first type measurement unit measures a film thickness. The second type measurement unit is a particle number measuring mechanism.