APPARATUS FOR MAKING THIN FILM

摘要

An apparatus for depositing a thin film is provided to prevent the damage of a substrate and to improve the connectivity between equipments by forming a thin film process part at a lower portion of the substrate. An apparatus for depositing a thin film comprises a chamber(32) having a gas flow inlet(36), a vacuum keeping part(34) located at one side of the chamber, a substrate fixing part(38) located at the upper portion of the camber, and a thin film process part(40) located at the lower portion of the substrate fixing part. The thin film process part further includes a composite quartz window(42), a heater(44) formed adjacent to the composite quartz window, and an eximer lamp(46) formed at the lower portion of the heater.