| 摘要 |
A charged particle beam apparatus is provided to control an irradiation angle of a gas-ion beam according to an arrangement state of a sliced specimen. A focused ion beam apparatus(3) manufactures a sliced specimen by processing a specimen, and observes the sliced specimen. A scanning electron microscope(4) observes the sliced specimen, and a gas-ion beam irradiation apparatus(5) performs finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen. A specimen stage(6) has at least one rotation axis, and the sliced specimen is fixed on the specimen stage. A specimen posture recognition member(7) recognizes a positional relation of the sliced specimen with respect to the specimen stage. A specimen stage control member(8) controls the specimen stage based on a specimen posture recognized by the specimen posture recognition member.
|
