| 摘要 |
A method for manufacturing an electron emission device, an electron source, and an image display device is provided to reduce a leakage current by removing an electron emitting film material from a hole. A structure having a first conductive layer(2), an insulating layer(3) disposed on the first conductive layer and a second conductive layer(4) disposed on the insulating layer is provided. A first hole penetrates to the first conductive layer through the insulating layer and the second conductive layer. A layer of material for an electron emitting member is deposited on an inner surface of the first hole. A second hole penetrating through the second conductive layer is formed on either of the insulating layer and the second conductive layer. A part of the insulating layer interposed between the juxtaposed first and second holes is etched until the first and second holes are communicated with each other.
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