发明名称 WAFER ASSEMBLING APPARATUS AND METHOD
摘要 An apparatus and a method for assembling substrates are provided to reduce a time required to make atmospheric pressure into a high-degree vacuum state and bond substrates to each other with high accuracy in the vacuum state. An apparatus(1) for assembling substrates includes a first chamber(C1), a second chamber(C2), and a third chamber(C3). Two substrates are loaded into the first chamber. The two substrates are bonded to each other in the second chamber. The bonded substrates are unloaded from the third chamber. The inner pressure states of the first chamber and the third chamber are controlled to become an intermediate vacuum state in which the two substrates are bonded to each other. The inner pressure state of the second chamber is controlled to be a high vacuum state from the intermediate vacuum state.
申请公布号 KR20070026019(A) 申请公布日期 2007.03.08
申请号 KR20060078352 申请日期 2006.08.18
申请人 HITACHI PLANT TECHNOLOGIES, LTD. 发明人 NAKAYAMA YUKINORI;YAMAMOTO TATSUHARU;SAITO MASAYUKI
分类号 G02F1/1339;G02F1/13 主分类号 G02F1/1339
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