SUBSTRATE TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To prevent treatment liquid droplets from being scattered outside a prescribed treatment space. SOLUTION: A substrate treatment device 1 comprises a droplet jet nozzle 2 for jetting the treatment liquid droplets toward a substrate 9 along with carrier gas; a shielding gas jet nozzle 4 having a shield gas jet 41 extended in parallel with a droplet jet 21 in the droplet jet nozzle 2 at both the sides in the traveling direction of the substrate 9; and a treatment liquid suction nozzle 3 for sucking the treatment liquid droplets while being arranged at the side of the droplet jet nozzle 2 in the shielding gas jet nozzle 4. In the substrate treatment device 1, the droplet jet region of the treatment liquid from the droplet jet nozzle 2 is surrounded by the jet stream of shielding gas from the shielding gas jet nozzle 4 on the substrate 9, thus preventing the treatment liquid droplets jetted from the droplet jet nozzle 2 from being scattered to a region outside the treatment space surrounded by the jet stream of the shielding gas on the substrate 9. A used treatment liquid can also be recovered efficiently. COPYRIGHT: (C)2007,JPO&INPIT