发明名称 |
Binary photomask having a compensation layer and method of manufacturing the same |
摘要 |
A binary photomask with an improved resolution and a method of manufacturing the same are provided. The binary photomask may include a substrate, a transmission-prevention pattern formed on the substrate to define a circuit pattern, and a compensation layer configured to change light transmitted through the binary photomask based on a topology of the compensation layer and arranged on the transmission-prevention layer and/or the substrate.
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申请公布号 |
US2007054200(A1) |
申请公布日期 |
2007.03.08 |
申请号 |
US20060446980 |
申请日期 |
2006.06.06 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG JIN-SIK;KIM HEE-BOM;HAN WOO-SUNG;HUH SUNG-MIN |
分类号 |
C23C14/00;C23C14/32;G03F1/48;G03F1/68;H01L21/027 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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