发明名称 Reference image forming apparatus, pattern inspection apparatus, and reference image forming method, and reticle
摘要 A method and apparatus for forming an appropriate reference image in inspection of a pattern of an object to be inspected depending on characteristics of the pattern are disclosed. A reference image forming apparatus includes an optical image acquisition unit which acquires an optical image of an object to be inspected, a conversion parameter determining unit which uses feature data based on the characteristic of the pattern of the image of the object to be inspected to calculate a conversion parameter from the optical image and design data of the object to be inspected, and a reference image creation unit which performs arithmetic processing to the conversion parameter and the design data to form a reference image.
申请公布号 US2007052960(A1) 申请公布日期 2007.03.08
申请号 US20050298720 申请日期 2005.12.12
申请人 ADVANCED MASK INSPECTION TECHNOLOGY INC. 发明人 HARABE NOBUYUKI
分类号 G01B11/00;G01N21/956;G03F1/84 主分类号 G01B11/00
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