| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a target which gives a zinc oxide-based electroconductive film having uniformity and high performance in an ion plating method while suppressing the generation of splash or without generating splash, and to provide a useful method for manufacturing the same. <P>SOLUTION: The target for forming the zinc oxide-based electroconductive film comprises a sintered compact mainly containing zinc oxide and is characterized in that the volume ratios of open and closed pores to the volume obtained from the external shape are 15-40% and ≤3.0%, respectively, and the generation of splash is inhibited during ion plating. <P>COPYRIGHT: (C)2007,JPO&INPIT |
