发明名称 |
SCANNING ELECTRON MICROSCOPE |
摘要 |
PROBLEM TO BE SOLVED: To provide a scanning electron microscope capable of executing inspection of a sample with high accuracy while suppressing decomposition of the sample without decreasing the inspection speed of the sample. SOLUTION: This scanning electron microscope 1 for obtaining an observation image of a reticle 107 by irradiating the reticle 107 (sample) with a primary electron beam and using secondarily emitted electrons is characterized by comprising a lamp 114 for emitting vacuum ultraviolet light having a wavelength below 172 nm to the reticle 107 in the atmosphere; an irradiation chamber 123 for sealing the reticle so as to allow the irradiation of the vacuum ultraviolet light to the reticle 107; and a sample holding device 125 holding the reticle 107 in the irradiation chamber 123 and capable of adjusting the distance between the lamp 114 and the reticle 107. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007059176(A) |
申请公布日期 |
2007.03.08 |
申请号 |
JP20050242181 |
申请日期 |
2005.08.24 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
FUKAYA RITSUO;SATO HIDETOSHI;O SHIKO;ARAI NORIAKI;ESUMI MAKOTO |
分类号 |
H01J37/28 |
主分类号 |
H01J37/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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