发明名称 SCANNING ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide a scanning electron microscope capable of executing inspection of a sample with high accuracy while suppressing decomposition of the sample without decreasing the inspection speed of the sample. SOLUTION: This scanning electron microscope 1 for obtaining an observation image of a reticle 107 by irradiating the reticle 107 (sample) with a primary electron beam and using secondarily emitted electrons is characterized by comprising a lamp 114 for emitting vacuum ultraviolet light having a wavelength below 172 nm to the reticle 107 in the atmosphere; an irradiation chamber 123 for sealing the reticle so as to allow the irradiation of the vacuum ultraviolet light to the reticle 107; and a sample holding device 125 holding the reticle 107 in the irradiation chamber 123 and capable of adjusting the distance between the lamp 114 and the reticle 107. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007059176(A) 申请公布日期 2007.03.08
申请号 JP20050242181 申请日期 2005.08.24
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 FUKAYA RITSUO;SATO HIDETOSHI;O SHIKO;ARAI NORIAKI;ESUMI MAKOTO
分类号 H01J37/28 主分类号 H01J37/28
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