| 摘要 |
An apparatus for cleaning a substrate is provided to rapidly and completely exhaust noxious gas in a process chamber by using a purge unit or a propulsion gas line. A cleaning solution is supplied to a process bath(110) in a manner that a substrate is soaked into the cleaning solution in a fabricating process. After the fabricating process is completed, noxious gas generated from the process bath is exhausted by an exhaust line(132). A propulsion gas line(210) is branched from the exhaust line, supplying propulsion gas to easily exhaust the noxious gas in the process bath from the exhaust line. A purge unit(300) supplies purge gas to the inside of the process bath in a manner that the noxious gas in the process bath is guided toward the exhaust line. The propulsion gas is supplied in the same direction as that of the noxious gas.
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