发明名称 FLAW MONITORING DEVICE
摘要 PROBLEM TO BE SOLVED: To solve the problem that it is difficult to adapt a conventional technique for providing a small-sized device which monitors the development and occurrence of a flaw using a potential difference method in case a measuring target is provided in a narrow part or covered with a cover material because a means for connecting a terminal for measuring potential difference or a terminal for supplying a current to the measuring target is complicated. SOLUTION: This technique can be adapted even in case the measuring target is provided in the narrow part or covered with the cover material by printing a potential measuring terminal and a current supplying terminal on a film-like substrate and can be also adapted even in case the measuring target is exposed to high temperature by using a heat-resistant plastic polymer material as a film. The structure of the flaw monitoring device is sharply miniaturized by monitoring the development and occurrence of the flaw and printing the potential measuring terminal and the current supplying terminal on the film-like substrate and an adaptation target part is expanded. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007057448(A) 申请公布日期 2007.03.08
申请号 JP20050245230 申请日期 2005.08.26
申请人 HITACHI LTD 发明人 OKIDO SHINOBU;NONAKA YOSHIO;SAITO KOICHI;MIYAZAKI KATSUMASA
分类号 G01N27/20 主分类号 G01N27/20
代理机构 代理人
主权项
地址