发明名称 |
Method of cleaning plasma applicator in situ and plasma applicator employing the same |
摘要 |
A method of cleaning a plasma generating area of a plasma applicator in situ is disclosed and comprises; supplying a by-product cleaning gas to the plasma generating area, and generating a plasma from the by-product cleaning gas in the plasma generating area.
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申请公布号 |
US2007051387(A1) |
申请公布日期 |
2007.03.08 |
申请号 |
US20060510757 |
申请日期 |
2006.08.28 |
申请人 |
HWANG WAN-GOO;HUH NO-HYUN;KIM IL-KYOUNG;SUH JEONG-SOO;YUN KI-YOUNG |
发明人 |
HWANG WAN-GOO;HUH NO-HYUN;KIM IL-KYOUNG;SUH JEONG-SOO;YUN KI-YOUNG |
分类号 |
B08B6/00;C23C16/00 |
主分类号 |
B08B6/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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