发明名称 Method of cleaning plasma applicator in situ and plasma applicator employing the same
摘要 A method of cleaning a plasma generating area of a plasma applicator in situ is disclosed and comprises; supplying a by-product cleaning gas to the plasma generating area, and generating a plasma from the by-product cleaning gas in the plasma generating area.
申请公布号 US2007051387(A1) 申请公布日期 2007.03.08
申请号 US20060510757 申请日期 2006.08.28
申请人 HWANG WAN-GOO;HUH NO-HYUN;KIM IL-KYOUNG;SUH JEONG-SOO;YUN KI-YOUNG 发明人 HWANG WAN-GOO;HUH NO-HYUN;KIM IL-KYOUNG;SUH JEONG-SOO;YUN KI-YOUNG
分类号 B08B6/00;C23C16/00 主分类号 B08B6/00
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