Master mold for offset process and pattern formation method using the same
摘要
<p>A master mold (30) for an offset process is disclosed which enables formation of electrodes with a complex pattern (32) or a very-fine pattern. A pattern formation method using the master mold is also disclosed. The master mold includes a plate (30) having a predetermined thickness, and an intaglio pattern (31) formed in a surface of the plate. The intaglio pattern has a cross-section having a surface inclined (122a) in a transfer direction of a material to be transferred.</p>
申请公布号
EP1760750(A1)
申请公布日期
2007.03.07
申请号
EP20060291406
申请日期
2006.09.06
申请人
LG ELECTRONICS INC.
发明人
PARK, DAE HYUN;KIM, KYUNG KU;SEO, BYUNG HWA;PARK, MIN SOO;JEON, WON SEOK;SHIN, DONG OH;PARK, DEOK HAI;LEE, HONG CHEOL;KIM, JE SEOK;RYU, BYUNG GIL