发明名称 Master mold for offset process and pattern formation method using the same
摘要 <p>A master mold (30) for an offset process is disclosed which enables formation of electrodes with a complex pattern (32) or a very-fine pattern. A pattern formation method using the master mold is also disclosed. The master mold includes a plate (30) having a predetermined thickness, and an intaglio pattern (31) formed in a surface of the plate. The intaglio pattern has a cross-section having a surface inclined (122a) in a transfer direction of a material to be transferred.</p>
申请公布号 EP1760750(A1) 申请公布日期 2007.03.07
申请号 EP20060291406 申请日期 2006.09.06
申请人 LG ELECTRONICS INC. 发明人 PARK, DAE HYUN;KIM, KYUNG KU;SEO, BYUNG HWA;PARK, MIN SOO;JEON, WON SEOK;SHIN, DONG OH;PARK, DEOK HAI;LEE, HONG CHEOL;KIM, JE SEOK;RYU, BYUNG GIL
分类号 H01J9/02;B41F17/14;B41M1/10;H01J11/22;H01J11/24;H01J11/34 主分类号 H01J9/02
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