发明名称 |
POLISHING METHOD FOR GLASS SUBSTRATE, AND GLASS SUBSTRATE |
摘要 |
<p>To provide a polishing method for a glass substrate required to have extremely high surface smoothness and surface precision, like a glass substrate to be used for e.g. a reflective mask for extreme ultra violet lithography. A surface of a glass substrate containing SiO<SUB>2 </SUB>as the main component, is polished with a polishing slurry comprising colloidal silica having an average primary particle size of at most 50 nm, an acid and water, and having the pH adjusted to be within a range of from 0.5 to 4, so that the surface roughness Rms will be at most 0.15 nm as measured by an atomic force microscope.</p> |
申请公布号 |
EP1758962(A1) |
申请公布日期 |
2007.03.07 |
申请号 |
EP20050753385 |
申请日期 |
2005.06.21 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
KOJIMA, HIROSHI;MISHIRO, HITOSHI;ITO, MASABUMI |
分类号 |
C09G1/02;B24B37/00;C09K3/14;G03F1/24;G03F1/60;H01L21/027 |
主分类号 |
C09G1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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