发明名称 PROJECTION SYSTEM WITH COMPENSATION OF INTENSITY VARIATONS AND COMPENSATION ELEMENT THEREFOR
摘要 In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
申请公布号 EP1759248(A1) 申请公布日期 2007.03.07
申请号 EP20050746777 申请日期 2005.06.03
申请人 CARL ZEISS SMT AG 发明人 SCHEIBLE, PATRICK;PAZIDIS, ALEXANDRA;GARREIS, REINER;TOTZECK, MICHAEL;GRAEUPNER, PAUL;ROSTALSKI, HANS-JUERGEN;SINGER, WOLFGANG
分类号 G03F7/20;G02B5/28;G02B13/02;G02B17/08;G02B21/33;G02B27/58 主分类号 G03F7/20
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