| 摘要 |
A plasma processor includes a table on which a target object is to be placed, a vessel which accommodates the table and in which a plasma is to be generated by a high-frequency electromagnetic field, a high-frequency oscillator ( 30 ) which generates a high-frequency electromagnetic field, and a reference oscillator ( 34 ) which is lower in output power than the high-frequency oscillator ( 30 ) and stable in oscillation frequency. A reference signal generated by the reference oscillator ( 34 ) is injected into the high-frequency oscillator ( 30 ) to fix an oscillation frequency of the high-frequency oscillator ( 30 ) at a frequency of a reference signal. Therefore, accurate load matching is performed to improve an energy efficiency when an automatic matching device provided between the high-frequency oscillator ( 30 ) and vessel is designed based on the frequency of the reference signal.
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