发明名称 Holding system, exposure apparatus, and device manufacturing method
摘要 A holding system for holding an object from above, against gravity. The holding system includes at least one holding portion adapted to be in contact with the object, to hold the object from above, at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto, and a gap measuring unit for measuring a gap between the object and the at least one attracting portion. The attraction force of the attracting portion is controlled on the basis of the measurement made by the gap measuring unit.
申请公布号 US7187432(B2) 申请公布日期 2007.03.06
申请号 US20040987148 申请日期 2004.11.15
申请人 CANON KABUSHIKI KAISHA 发明人 MATSUI SHIN
分类号 G02B7/00;G03B27/58;G02B7/198;G02B17/00;G03F1/16;G03F1/22;G03F1/24;G03F7/20;H01L21/027;H01L21/68;H01L21/683 主分类号 G02B7/00
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