发明名称 |
Inspection method and a photomask |
摘要 |
An inspection method, includes obtaining a first optical characteristic of a projection optical system by transferring an image of an aberration measurement unit of a photomask on a first resist film coated on a first wafer by use of a first polarized exposure light; obtaining a second optical characteristic of the projection optical system by transferring the image of the aberration measurement unit on a second resist film coated on a second wafer by use of a second exposure light having a polarization state different from the first exposure light; and calculating a difference between the first and second optical characteristics. |
申请公布号 |
US7186485(B2) |
申请公布日期 |
2007.03.06 |
申请号 |
US20030615228 |
申请日期 |
2003.07.09 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
FUKUHARA KAZUYA;TANAKA SATOSHI;INOUE SOICHI |
分类号 |
G01M11/02;G03F9/00;G02B5/30;G03C5/00;G03F1/08;G03F1/44;G03F7/20;H01L21/027 |
主分类号 |
G01M11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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