发明名称 |
Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabrication |
摘要 |
The present invention relates to monitoring and controlling a reticle fabrication process (e.g. employed with an electron beam lithography process). A typical fabrication process involves discrete stages including exposure, post-exposure bake and development. After fabrication is complete, an inspection can be performed on the reticle to determine whether any parameters during fabrication and/or any data points are outside of acceptable tolerances. The data is collected and fed into an algorithm (e.g. data-mining algorithm) utilized to determine which fabrication parameters need to be modified then sends the data to a control system (e.g. advanced process control) to facilitate needed changes to the fabrication parameters.
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申请公布号 |
US7187796(B1) |
申请公布日期 |
2007.03.06 |
申请号 |
US20030676613 |
申请日期 |
2003.10.01 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
PHAN KHOI A.;SUBRAMANIAN RAMKUMAR;SINGH BHANWAR |
分类号 |
G06K9/00 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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