发明名称 |
Device and method for cleaning photomask |
摘要 |
Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
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申请公布号 |
US7186301(B2) |
申请公布日期 |
2007.03.06 |
申请号 |
US20060276974 |
申请日期 |
2006.03.20 |
申请人 |
PKL CO., LTD. |
发明人 |
KIM YONG DAE;KIM JONG MIN;KANG HAN BYUL;CHO HYUN JOON;CHOI SANG SOO |
分类号 |
B08B3/00;B08B3/08;G03F1/82 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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