| 摘要 |
A method for cleaning a substrate is provided to uniformly inject a cleaning solution to a substrate by preventing bubbles from being generated in the cleaning solution. Hydrofluoric acid diluted by using deionized water is injected to the surface of a substrate to remove impurities. The substrate is rinsed. Ozone water and ammonium hydroxide are injected to the surface of the substrate to eliminate impurities wherein the ozone water and the ammonium hydroxide are independently and simultaneously injected through each nozzle(S12). The substrate is rinsed(S14). The rinsed substrate is dried(S16).
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